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  • System Design Considerations Using TI DLP® Technology in UVA

    • DLPA060B July   2015  – November 2024 DLP7000UV , DLP9000XUV , DLP9500UV

       

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  • System Design Considerations Using TI DLP® Technology in UVA
  1.   1
  2.   System Design Considerations Using TI DLP® Technology in UVA
  3.   Trademarks
  4. 1Introduction
  5. 2Thermal
  6. 3Duty Cycle
  7. 4Optical
  8. 5High Demagnification Systems
    1. 5.1 Incoherent Sources (Lamps and LEDs)
    2. 5.2 Coherent Sources (Lasers)
  9. 6Conclusion
  10. 7References
  11. 8Revision History
  12. IMPORTANT NOTICE
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Application Note

System Design Considerations Using TI DLP® Technology
in UVA

Abstract

Advanced technologies such as direct imaging lithography and 3D printing often use photoreactive materials optimized for the ultraviolet region of the electromagnetic spectrum. This application report examines some of the thermal, duty cycle, general optical, coherency, and high demagnification design considerations for using a TI DLP® UV digital micromirror device (DMD) that is designed to operate in the UVA region of the UV spectrum.

 

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