TI DLP® 技術採用專門設計的近紅外線 (NIR) 裝置，爲 3D 掃描和 3D 機械視覺提供一系列高速晶片。可編程模式、可擴充平台與高速像素資料速率，實現 700nm 以上的創新結構光設計和其他模式產生解決方案。利用第三方光學模組、演算法軟體和設計支援，迅速開始您的設計。
設計與開發資源
光學模組
DLP® 產品第三方搜尋工具
To best meet your design needs and accelerate your time-to-market, DLP® Products works with a variety of third parties to help with everything from optical modules and hardware design to specialty software and other production services. Download one or both search tools listed below to quickly (...)
開發板
DLP650LNIR DMD 評估模組
This DLP evaluation module (EVM) houses DLP650LNIR, a 0.65 NIR WXGA Series 450 DMD intended for use in applications using 850-2000 nm near-infrared (NIR) illumination sources. DLPLCR65NEVM is an advanced imaging option for laser sintering, ablation, marking, coding, printing and other applications (...)
參考設計
具有 Bluetooth 連線且適用於可攜式化學分析的 DLP 超行動 NIR 光譜儀
The ultra-mobile near-infrared (NIR) spectrometer reference design utilizes Texas Instruments' DLP technology in conjunction with a single-element InGaAs detector to deliver high performance measurements in a portable form factor that is more affordable than architectures using an expensive InGaAs (...)