The DLPLCRC410EVM, paired with one of five other DMD-based EVMs, is an evaluation platform exhibiting advanced light control for applications like lithography, 3D Printing (SLS and SLA), Machine Vision, and Marking and Coding. This EVM enables evaluations of new customer illumination sources, optics, algorithm, and exposure processes to quicken potential evaluation of DLP technology, customer learning cycles, and times to market.