DLP650LNIR
- 1280 × 800 (WXGA) Array with >1 Million Micromirrors
- 10.8 µm Micromirror Pitch
- ±12° Micromirror Tilt Angle (Relative to Flat State)
- 0.65-Inch Diagonal Array Designed for Corner Illumination
- 0.5 °C/W Thermal Resistance High Efficiency Package
- Efficient Steering of NIR Light ( 800 nm to 2000 nm)
- Up to 160-W Incident on DMD
- Window Transmission Efficiency >98% (950 nm to 1150 nm, Single Pass, Two Window Surfaces)
- Window Transmission Efficiency >93% (850 nm to 2000 nm, Single Pass, Two Window Surfaces)
- Polarization Independent Aluminum Micromirrors
- 16-Bit, 2xLVDS, 400-MHz Input Data Bus
- Dedicated DLPC410 Controller, DLPR410 PROM, and DLPA200 Micromirror Driver for Reliable High Speed Operation
- Binary Pattern Rates up to 12,500 Hz
- Global, Single, Dual, and Quad Block Mirror Clocking Pulse (Reset) Operational Modes
The DLP650LNIR digital micromirror device (DMD) operates as a spatial light modulator (SLM) to steer near-infrared (NIR) light and generate high speed patterns for advanced imaging in industrial equipment. The thermally efficient package allows customers to combine the DMD with high-power NIR laser illumination for dynamic digital printing, sintering and marking solutions. The DLP650LNIR, DLPC410, DLPR410 and DLPA200 chipset provides 1-bit pattern rates up to 12,500 Hz with pixel-accurate control so engineers can design more innovative and precise optical systems than traditional steering lasers allow.
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DLPLCR65NEVM — DLP650LNIR DMD 評估模組
DLPLCRC410EVM — DLPLCRC410 評估模組
OPTECKS-3P-DLP650LNIR-EVM — Optecks DLP650LNIR DMD 評估模組
The Optecks DLP650LNIR evaluation module (EVM) includes DLP650LNIR DMD, a 0.65" NIR WXA Series 450 DMD designed to be used in applications that operate in 850-2000 nm near-infrared (NIR) spectrum. Optecks DLP650LNIR EVM is an advanced imaging solution for laser sintering, ablation, marking, coding, (...)
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As a new approach for polymer-based Powder Bed Fusion, VISITECH is introducing the LRS-MCx-WX light engine, providing unprecedented Near-IR power of more than 100 W in the projected 2D image. This is offering a path towards high productivity systems in Powder Bed Fusion as an alternative to (...)
VIALUX-3P-V-MODULES-410 — 適用於 DLPC410 的 ViALUX V 模組
DLP-OMM-SEARCH — DLP® 產品第三方搜尋工具
To best meet your design needs and accelerate your time-to-market, DLP® Products works with a variety of third parties to help with everything from optical modules and hardware design to specialty software and other production services. Download one or both search tools listed below to quickly (...)
OPTECKS-3P-SPARKNIR — Optecks Telecentric NIR 光學引擎
The SPARK NIR telecentric optical engine is designed for the 0.65” digital micro-mirror devices with 16:9 aspect ratio such as the DLP650LNIR. All optical components have a high-quality anti-reflection (AR) coating within 600 - 1050 nm spectrum. The SPARK optical engine has the capability of (...)
VIALUX-3P-DLP650LNIR-I — 適合使用 DLP650LNIR 之工業的 ViALUX GmbH 光學模組
WDST-3P-PRO650NIR — Wintech PRO650NIR 高功率光刻頭
PRO650NIR 光刻頭整合了我們的 DLP650LNIR 0.65" WXGA DMD 和 DLPC410 晶片組。此晶片組可用於選擇層燒結 (包括尼龍應用)、動態雷射標記和工業列印應用。PRO650LNIR 使用 Wintech 提供的 1064-nm 或 976-nm 光纖雷射提供超過 100-W 的輸出,但客戶提供的雷射也可搭配內建 SMA905 光纖介面使用。現成的 47-um 像素可供於公司內部設計和製造自訂透鏡。此系統採用前側 DMD (氣體) 和液體冷卻進行散熱管理,每秒最高可達 10,000 個二進位訊框。
VIALUX-3P-ALP-4 — 用於 DLPLCRC410 的 ViALUX ALP-4.1 控制器軟體套件評估模組
DMD-DIFFRACTION-EFFICIENCY-CALCULATOR — Calculator helps model DMD diffraction patterns and diffraction efficiency
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DLPC132 — Series 450 DMD Mounting & Electrical Interconnect Information
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可見產品 (420 至 700 nm)
Near-infrared products (> 700 nm)
≥ 0.47 吋陣列產品
DLPR046 — Series 450 DMD Mounting and Electrical Interconnect Information
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可見產品 (420 至 700 nm)
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≥ 0.47 吋陣列產品
DLP-OPTICAL-DESIGN — DLP-OPTICAL-DESIGN-GUIDELINES
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產品
近紫外線產品 (400 至 420 nm)
≥ 0.47 吋陣列產品
≤ 0.47 吋陣列 pico 產品
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光譜與光學網路產品
外部照明與投影產品
顯示產品
Near-infrared products (> 700 nm)
多通道 IC (PMIC)
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DLPR105 — DLP650LNIR Optical Design Files
支援產品和硬體
DLPR410-IBIS — DLPR410 IBIS 機型
封裝 | 針腳 | CAD 符號、佔位空間與 3D 模型 |
---|---|---|
DLP-S450 (FYL) | 149 | Ultra Librarian |
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- 進行中持續性的可靠性監測
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